Jacques Perrin Toinin, Alain Portavoce, Khalid Hoummada, Michael Texier, Maxime Bertoglio, et al.. Nanoporous Ge thin film production combining Ge sputtering and dopant implantation.
Beilstein Journal of Nanotechnology, Karlsruhe Institute of Technology., 2015, 6, pp.336-342.
⟨10.3762/bjnano.6.32⟩.
⟨hal-01229375⟩