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3D morphological and structural nano-characterization for microelectronics: the potential of recent, long synchrotron beamlines

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https://hal-amu.archives-ouvertes.fr/hal-01453356
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Submitted on : Thursday, February 2, 2017 - 4:58:46 PM
Last modification on : Thursday, March 15, 2018 - 4:56:07 PM

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  • HAL Id : hal-01453356, version 1

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A. Fraczkiewicz, E. Capria, G. Chahine, P. Cloetens, J. Da Silva, et al.. 3D morphological and structural nano-characterization for microelectronics: the potential of recent, long synchrotron beamlines. X-Ray Microscopy Conference (XRM 2016), Aug 2016, Oxford, United Kingdom. ⟨hal-01453356⟩

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