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New strategies for producing strain engineered SiGe nanomembranes

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https://hal-amu.archives-ouvertes.fr/hal-01454799
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Submitted on : Friday, February 3, 2017 - 9:23:25 AM
Last modification on : Monday, September 23, 2019 - 2:42:03 PM

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  • HAL Id : hal-01454799, version 1

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T. David, Abdelmalek Benkouider, L. Kailang, J.N. Aqua, A. Rond, et al.. New strategies for producing strain engineered SiGe nanomembranes. Journées Surfaces Interfaces, Jan 2016, Marseille, France. ⟨hal-01454799⟩

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