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Strain distribution induced in SOI photonic substrate by TSVs, using advanced X- ray nano-diffraction

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https://hal-amu.archives-ouvertes.fr/hal-01454828
Contributor : Im2np Bibliométrie <>
Submitted on : Friday, February 3, 2017 - 9:37:31 AM
Last modification on : Wednesday, May 16, 2018 - 3:04:02 PM

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  • HAL Id : hal-01454828, version 1

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S. Escoubas, B. Vianne, M.I. Richard, V. Fiori, A. Farcy, et al.. Strain distribution induced in SOI photonic substrate by TSVs, using advanced X- ray nano-diffraction. Materials for Advanced Metallization, MAM 2016, Mar 2016, Brussels, Belgium. ⟨hal-01454828⟩

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