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Evaluation of Alternative Atomistic Models for the Incipient Growth of ZnO by Atomic Layer Deposition

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https://hal-amu.archives-ouvertes.fr/hal-01705058
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Submitted on : Friday, February 9, 2018 - 8:59:49 AM
Last modification on : Thursday, October 8, 2020 - 3:10:12 AM

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Manh-Hung Chu, Liang Tian, Ahmad Chaker, Evgenii Skopin, Valentina Cantelli, et al.. Evaluation of Alternative Atomistic Models for the Incipient Growth of ZnO by Atomic Layer Deposition. Journal of Electronic Materials, Institute of Electrical and Electronics Engineers, 2017, 46 (6), pp.3512 - 3517. ⟨10.1007/s11664-017-5448-2⟩. ⟨hal-01705058⟩

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