Evaluation of Alternative Atomistic Models for the Incipient Growth of ZnO by Atomic Layer Deposition

Manh-Hung Chu; Liang Tian; Ahmad Chaker; Evgenii Skopin; Valentina Cantelli; Toufik Ouled; Raphael Boichot; Alexandre Crisci; Sabine Lay; Marie-Ingrid Richard; Olivier Thomas; Jean-Luc Deschanvres; Hubert Renevier; Dillon Fong; Gianluca Ciatto

doi:10.1007/s11664-017-5448-2

Journal articles

Evaluation of Alternative Atomistic Models for the Incipient Growth of ZnO by Atomic Layer Deposition

Manh-Hung Chu ¹ Liang Tian ² Ahmad Chaker ² Evgenii Skopin ² Valentina Cantelli ² Toufik Ouled Raphael Boichot ³ Alexandre Crisci ⁴ Sabine Lay ⁴ Marie-Ingrid Richard ⁵ Olivier Thomas ⁵ Jean-Luc Deschanvres ² Hubert Renevier ² Dillon Fong Gianluca Ciatto ⁶

1 ESRF - European Synchrotron Radiation Facility

2 LMGP - Laboratoire des matériaux et du génie physique

3 Grenoble INP - Institut polytechnique de Grenoble - Grenoble Institute of Technology

4 SIMaP - Science et Ingénierie des Matériaux et Procédés

5 IM2NP - Institut des Matériaux, de Microélectronique et des Nanosciences de Provence

6 SSOLEIL - Synchrotron SOLEIL

Document type :

Journal articles

Domain :

Engineering Sciences [physics] / Micro and nanotechnologies/Microelectronics

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https://hal-amu.archives-ouvertes.fr/hal-01705058
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Submitted on : Friday, February 9, 2018 - 8:59:49 AM
Last modification on : Thursday, June 9, 2022 - 8:20:07 AM

Evaluation of Alternative Atomistic Models for the Incipient Growth of ZnO by Atomic Layer Deposition

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Evaluation of Alternative Atomistic Models for the Incipient Growth of ZnO by Atomic Layer Deposition

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