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Evaluation of Alternative Atomistic Models for the Incipient Growth of ZnO by Atomic Layer Deposition

Manh-Hung Chu 1 Liang Tian 2 Ahmad Chaker 2 Evgenii Skopin 2 Valentina Cantelli 2 Toufik Ouled Raphael Boichot 3 Alexandre Crisci 4 Sabine Lay 4 Marie-Ingrid Richard 5 Olivier Thomas 5 Jean-Luc Deschanvres 2 Hubert Renevier 2 Dillon Fong Gianluca Ciatto 6
1 ESRF - European Synchrotron Radiation Facility
2 LMGP [?-2019] - Laboratoire des matériaux et du génie physique [?-2019]
3 Grenoble INP [2007-2019] - Institut polytechnique de Grenoble - Grenoble Institute of Technology [2007-2019]
4 SIMaP - Science et Ingénierie des Matériaux et Procédés
5 IM2NP - Institut des Matériaux, de Microélectronique et des Nanosciences de Provence
6 SSOLEIL - Synchrotron SOLEIL
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https://hal-amu.archives-ouvertes.fr/hal-01705058
Contributor : Im2np Bibliométrie <>
Submitted on : Friday, February 9, 2018 - 8:59:49 AM
Last modification on : Thursday, October 8, 2020 - 3:10:12 AM

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Manh-Hung Chu, Liang Tian, Ahmad Chaker, Evgenii Skopin, Valentina Cantelli, et al.. Evaluation of Alternative Atomistic Models for the Incipient Growth of ZnO by Atomic Layer Deposition. Journal of Electronic Materials, Institute of Electrical and Electronics Engineers, 2017, 46 (6), pp.3512 - 3517. ⟨10.1007/s11664-017-5448-2⟩. ⟨hal-01705058⟩

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