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Magnesium silicide thin film formation by reactive diffusion

Iu. Kogut 1 M.-C. Record 2, 3
1 LPNU - National Polytechnic University of Lviv
2 IM2NP - Institut des Matériaux, de Microélectronique et des Nanosciences de Provence
3 AMU - Aix Marseille Université
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Journal articles
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https://hal-amu.archives-ouvertes.fr/hal-01756328
Contributor : Marie-Christine Record <>
Submitted on : Sunday, April 1, 2018 - 8:46:51 PM
Last modification on : Wednesday, November 6, 2019 - 6:27:09 PM

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UNIV-AMU | CNRS | UNIV-TLN | IM2NP

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Iu. Kogut, M.-C. Record. Magnesium silicide thin film formation by reactive diffusion. Thin Solid Films, Elsevier, 2012, 522, pp.149 - 158. ⟨10.1016/j.tsf.2012.08.037⟩. ⟨hal-01756328⟩

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