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Atmospheric Pressure Chemical Vapor Deposition and characterization of TiO2 antireflection coatings for monocrystalline silicon solar cells

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https://hal-amu.archives-ouvertes.fr/hal-01757696
Contributor : Philippe Torchio <>
Submitted on : Tuesday, April 3, 2018 - 7:38:08 PM
Last modification on : Tuesday, March 30, 2021 - 3:22:44 AM

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D. Hocine, M. Pasquinelli, Ludovic Escoubas, P. Torchio, A. Moreau, et al.. Atmospheric Pressure Chemical Vapor Deposition and characterization of TiO2 antireflection coatings for monocrystalline silicon solar cells. 2011 International Conference on Clean Electrical Power (ICCEP) - Proceedings of the ICCEP'2011, IEEE-IES (Industrial Electronics Society), pp. 145-152 (2011)., Jun 2011, Ischia, France. ⟨10.1109/ICCEP.2011.6036368⟩. ⟨hal-01757696⟩

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