Atmospheric Pressure Chemical Vapor Deposition and characterization of TiO2 antireflection coatings for monocrystalline silicon solar cells - Archive ouverte HAL Access content directly
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Atmospheric Pressure Chemical Vapor Deposition and characterization of TiO2 antireflection coatings for monocrystalline silicon solar cells

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hal-01757696 , version 1 (03-04-2018)

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D. Hocine, M. Pasquinelli, Ludovic Escoubas, P. Torchio, A. Moreau, et al.. Atmospheric Pressure Chemical Vapor Deposition and characterization of TiO2 antireflection coatings for monocrystalline silicon solar cells. 2011 International Conference on Clean Electrical Power (ICCEP) - Proceedings of the ICCEP'2011, IEEE-IES (Industrial Electronics Society), pp. 145-152 (2011)., Jun 2011, Ischia, France. ⟨10.1109/ICCEP.2011.6036368⟩. ⟨hal-01757696⟩
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