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Atmospheric Pressure Chemical Vapor Deposition and characterization of TiO2 antireflection coatings for monocrystalline silicon solar cells

D. Hocine M. Pasquinelli 1 Ludovic Escoubas 1 P. Torchio 1 A. Moreau 1 Ms. Belkaid
1 IM2NP - Institut des Matériaux, de Microélectronique et des Nanosciences de Provence
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https://hal-amu.archives-ouvertes.fr/hal-01758774
Contributor : Philippe Torchio <>
Submitted on : Wednesday, April 4, 2018 - 5:37:39 PM
Last modification on : Monday, September 23, 2019 - 2:36:04 PM

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UNIV-AMU | CNRS | UNIV-TLN | IM2NP

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D. Hocine, M. Pasquinelli, Ludovic Escoubas, P. Torchio, A. Moreau, et al.. Atmospheric Pressure Chemical Vapor Deposition and characterization of TiO2 antireflection coatings for monocrystalline silicon solar cells. 14th International Conference on Harmonics and Quality of Power (ICHQP'2010), Sep 2010, Ischia, France. ⟨10.1109/ICCEP.2011.6036368⟩. ⟨hal-01758774⟩

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