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Communication Dans Un Congrès Année : 2010

Atmospheric Pressure Chemical Vapor Deposition and characterization of TiO2 antireflection coatings for monocrystalline silicon solar cells

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hal-01758774 , version 1 (04-04-2018)

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D. Hocine, M. Pasquinelli, Ludovic Escoubas, P. Torchio, A. Moreau, et al.. Atmospheric Pressure Chemical Vapor Deposition and characterization of TiO2 antireflection coatings for monocrystalline silicon solar cells. 14th International Conference on Harmonics and Quality of Power (ICHQP'2010), Sep 2010, Ischia, France. ⟨10.1109/ICCEP.2011.6036368⟩. ⟨hal-01758774⟩
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