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Tritium retention in next step devices and the requirements for mitigation and removal techniques

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https://hal-amu.archives-ouvertes.fr/hal-01766408
Contributor : Evelyne Salançon <>
Submitted on : Friday, April 13, 2018 - 3:39:42 PM
Last modification on : Thursday, June 25, 2020 - 2:54:33 PM

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C Counsell, C Coad, C Grisola, C. Hopf, J. Jacob, et al.. Tritium retention in next step devices and the requirements for mitigation and removal techniques. Plasma Physics and Controlled Fusion, IOP Publishing, 2006, 48 (12B), pp.B189 - B199. ⟨10.1088/0741-3335/48/12B/S18⟩. ⟨hal-01766408⟩

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