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https://hal-amu.archives-ouvertes.fr/hal-01781799
Submitted on : Monday, April 30, 2018-5:10:54 PM
Last modification on : Wednesday, February 8, 2023-5:11:04 PM
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- HAL Id : hal-01781799 , version 1
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M. Gallard, M.S. Amara, F. Lauraux, C. Guichet, M.-I. Richard, et al.. In-situ combined X-Ray diffraction and optical curvature measurements to study microstructure and stress induced during the crystallization of GeTe thin films. MAM2017 – Materials for Advanced Metallization Conference, Mar 2017, Dresden, Germany. ⟨hal-01781799⟩
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