In-situ combined X-Ray diffraction and optical curvature measurements to study microstructure and stress induced during the crystallization of GeTe thin films

M. Gallard , M.S. Amara , F. Lauraux , C. Guichet , M.-I. Richard (1) , S. Escoubas (1) , C. Mocuta , P. Noé , C. Sabbione , F. Hippert , Magali Putero (1) , N. Burle , O. Thomas (1)

1 IM2NP - Institut des Matériaux, de Microélectronique et des Nanosciences de Provence

Domains: Engineering Sciences [physics]; Micro and nanotechnologies/Microelectronics

M. Gallard, M.S. Amara, F. Lauraux, C. Guichet, M.-I. Richard, et al.. In-situ combined X-Ray diffraction and optical curvature measurements to study microstructure and stress induced during the crystallization of GeTe thin films. MAM2017 – Materials for Advanced Metallization Conference, Mar 2017, Dresden, Germany. ⟨hal-01781799⟩