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In-situ combined X-Ray diffraction and optical curvature measurements to study microstructure and stress induced during the crystallization of GeTe thin films

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https://hal-amu.archives-ouvertes.fr/hal-01781799
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Submitted on : Monday, April 30, 2018 - 5:10:54 PM
Last modification on : Tuesday, September 24, 2019 - 1:16:06 PM

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M. Gallard, M.S. Amara, F. Lauraux, C. Guichet, M.-I. Richard, et al.. In-situ combined X-Ray diffraction and optical curvature measurements to study microstructure and stress induced during the crystallization of GeTe thin films. MAM2017 – Materials for Advanced Metallization Conference, Mar 2017, Dresden, Germany. ⟨hal-01781799⟩

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