In-situ combined X-Ray diffraction and optical curvature measurements to study microstructure  and stress induced during the crystallization of GeTe thin films

M. Gallard; M.S. Amara; F. Lauraux; C. Guichet; M.-I. Richard; S. Escoubas; C. Mocuta; P. Noé; C. Sabbione; F. Hippert; Magali Putero; N. Burle; O. Thomas

Conference papers

In-situ combined X-Ray diffraction and optical curvature measurements to study microstructure and stress induced during the crystallization of GeTe thin films

M. Gallard M.S. Amara F. Lauraux C. Guichet M.-I. Richard ¹ S. Escoubas ¹ C. Mocuta P. Noé C. Sabbione F. Hippert Magali Putero ¹ N. Burle O. Thomas ¹

1 IM2NP - Institut des Matériaux, de Microélectronique et des Nanosciences de Provence

Document type :

Conference papers

Domain :

Engineering Sciences [physics] / Micro and nanotechnologies/Microelectronics

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https://hal-amu.archives-ouvertes.fr/hal-01781799
Contributor : Im2np Bibliométrie <>
Submitted on : Monday, April 30, 2018 - 5:10:54 PM
Last modification on : Tuesday, September 24, 2019 - 1:16:06 PM

In-situ combined X-Ray diffraction and optical curvature measurements to study microstructure and stress induced during the crystallization of GeTe thin films

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In-situ combined X-Ray diffraction and optical curvature measurements to study microstructure and stress induced during the crystallization of GeTe thin films

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