Evolution of early formed NiSi2 during the reaction between Ni(W, Pt) films and Si (001)

T. Luo; M. Bertoglio; Christophe Girardeaux; Dominique Mangelinck

doi:10.1016/j.mne.2018.10.004

Journal articles

Evolution of early formed NiSi2 during the reaction between Ni(W, Pt) films and Si (001)

T. Luo ¹ M. Bertoglio ¹ Christophe Girardeaux ¹ Dominique Mangelinck ¹

1 IM2NP - Institut des Matériaux, de Microélectronique et des Nanosciences de Provence

Document type :

Journal articles

Domain :

Physics [physics] / Condensed Matter [cond-mat] / Materials Science [cond-mat.mtrl-sci]

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https://hal-amu.archives-ouvertes.fr/hal-02044789
Contributor : Christophe Girardeaux Connect in order to contact the contributor
Submitted on : Thursday, February 21, 2019 - 4:19:44 PM
Last modification on : Tuesday, October 19, 2021 - 11:00:02 PM

Evolution of early formed NiSi2 during the reaction between Ni(W, Pt) films and Si (001)

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Evolution of early formed NiSi2 during the reaction between Ni(W, Pt) films and Si (001)

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