Evolution of early formed NiSi2 during the reaction between Ni(W, Pt) films and Si (001) - Aix-Marseille Université Accéder directement au contenu
Article Dans Une Revue Micro and Nano Engineering Année : 2018

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hal-02044789 , version 1 (21-02-2019)

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T. Luo, M. Bertoglio, Christophe Girardeaux, Dominique Mangelinck. Evolution of early formed NiSi2 during the reaction between Ni(W, Pt) films and Si (001). Micro and Nano Engineering, 2018, 1, pp.49-55. ⟨10.1016/j.mne.2018.10.004⟩. ⟨hal-02044789⟩
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