Evolution of early formed NiSi2 during the reaction between Ni(W, Pt) films and Si (001)

T. Luo; M. Bertoglio; Christophe Girardeaux; Dominique Mangelinck

doi:10.1016/j.mne.2018.10.004

Journal Articles Micro and Nano Engineering Year : 2018

Evolution of early formed NiSi2 during the reaction between Ni(W, Pt) films and Si (001)

(1) , (1) , (1) , (1)

1

T. Luo

Function : Author

Institut des Matériaux, de Microélectronique et des Nanosciences de Provence

M. Bertoglio

Function : Author
PersonId : 171872
IdHAL : maxime-bertoglio

Institut des Matériaux, de Microélectronique et des Nanosciences de Provence

Christophe Girardeaux

Function : Author
PersonId : 172869
IdHAL : christophe-girardeaux
ORCID : 0000-0002-7159-3785
IdRef : 078779375

Institut des Matériaux, de Microélectronique et des Nanosciences de Provence

Dominique Mangelinck

Function : Author
PersonId : 17430
IdHAL : dominique-mangelinck
ORCID : 0000-0002-3429-1948
IdRef : 086297600

Institut des Matériaux, de Microélectronique et des Nanosciences de Provence

Domains

Materials Science [cond-mat.mtrl-sci]

Christophe Girardeaux : Connect in order to contact the contributor

https://hal-amu.archives-ouvertes.fr/hal-02044789

Submitted on : Thursday, February 21, 2019-4:19:44 PM

Last modification on : Friday, March 24, 2023-2:53:09 PM

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hal-02044789 , version 1 (21-02-2019)

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HAL Id : hal-02044789 , version 1
DOI : 10.1016/j.mne.2018.10.004

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T. Luo, M. Bertoglio, Christophe Girardeaux, Dominique Mangelinck. Evolution of early formed NiSi2 during the reaction between Ni(W, Pt) films and Si (001). Micro and Nano Engineering, 2018, 1, pp.49-55. ⟨10.1016/j.mne.2018.10.004⟩. ⟨hal-02044789⟩

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Evolution of early formed NiSi2 during the reaction between Ni(W, Pt) films and Si (001)

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