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Mn Diffusion and Reactive Diffusion in Ge: Spintronic Applications

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https://hal-amu.archives-ouvertes.fr/hal-02044836
Contributor : Christophe Girardeaux <>
Submitted on : Thursday, February 21, 2019 - 4:34:53 PM
Last modification on : Thursday, July 30, 2020 - 11:29:27 AM

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Alain Portavoce, Omar Abbes, Sylvain Bertaina, Yauheni Rudzevich, Lee Chow, et al.. Mn Diffusion and Reactive Diffusion in Ge: Spintronic Applications. Defect and Diffusion Forum, Trans Tech Publications, 2015, 363, pp.56-61. ⟨10.4028/www.scientific.net/DDF.363.56⟩. ⟨hal-02044836⟩

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