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Journal articles

Arsenic and phosphorus codiffusion during silicon microelectronic processes

N. Rodriguez A. Portavoce 1 J. Delalleau C. Grosjean V. Serradeil 2 Christophe Girardeaux 1
1 IM2NP - Institut des Matériaux, de Microélectronique et des Nanosciences de Provence
2 ST-ROUSSET - STMicroelectronics [Rousset]
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Journal articles
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https://hal-amu.archives-ouvertes.fr/hal-02044923
Contributor : Christophe Girardeaux Connect in order to contact the contributor
Submitted on : Thursday, February 21, 2019 - 4:57:10 PM
Last modification on : Tuesday, October 19, 2021 - 11:00:00 PM

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  • HAL Id : hal-02044923, version 1

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UNIV-AMU | CNRS | IM2NP | UNIV-TLN

Citation

N. Rodriguez, A. Portavoce, J. Delalleau, C. Grosjean, V. Serradeil, et al.. Arsenic and phosphorus codiffusion during silicon microelectronic processes. Thin Solid Films, Elsevier, 2010, 518 (17), pp.5022-5027. ⟨hal-02044923⟩

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