Skip to Main content Skip to Navigation
Journal articles

Arsenic and phosphorus codiffusion during silicon microelectronic processes

Complete list of metadatas

https://hal-amu.archives-ouvertes.fr/hal-02044923
Contributor : Christophe Girardeaux <>
Submitted on : Thursday, February 21, 2019 - 4:57:10 PM
Last modification on : Wednesday, November 6, 2019 - 6:27:09 PM

Identifiers

  • HAL Id : hal-02044923, version 1

Collections

Citation

N. Rodriguez, A. Portavoce, J. Delalleau, C. Grosjean, V. Serradeil, et al.. Arsenic and phosphorus codiffusion during silicon microelectronic processes. Thin Solid Films, Elsevier, 2010, 518 (17), pp.5022-5027. ⟨hal-02044923⟩

Share

Metrics

Record views

81