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Submitted on : Thursday, February 21, 2019 - 4:57:10 PM Last modification on : Tuesday, March 30, 2021 - 3:23:29 AM
N. Rodriguez, A. Portavoce, J. Delalleau, C. Grosjean, V. Serradeil, et al.. Arsenic and phosphorus codiffusion during silicon microelectronic processes. Thin Solid Films, Elsevier, 2010, 518 (17), pp.5022-5027. ⟨hal-02044923⟩