Journal Articles
Thin Solid Films
Year : 2010
Christophe Girardeaux : Connect in order to contact the contributor
https://hal-amu.archives-ouvertes.fr/hal-02044923
Submitted on : Thursday, February 21, 2019-4:57:10 PM
Last modification on : Friday, March 24, 2023-2:53:09 PM
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- HAL Id : hal-02044923 , version 1
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N. Rodriguez, A. Portavoce, J. Delalleau, C. Grosjean, V. Serradeil, et al.. Arsenic and phosphorus codiffusion during silicon microelectronic processes. Thin Solid Films, 2010, 518 (17), pp.5022-5027. ⟨hal-02044923⟩
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