HAL will be down for maintenance from Friday, June 10 at 4pm through Monday, June 13 at 9am. More information
Skip to Main content Skip to Navigation
Journal articles

Arsenic and phosphorus codiffusion during silicon microelectronic processes

Complete list of metadata

https://hal-amu.archives-ouvertes.fr/hal-02044923
Contributor : Christophe Girardeaux Connect in order to contact the contributor
Submitted on : Thursday, February 21, 2019 - 4:57:10 PM
Last modification on : Tuesday, October 19, 2021 - 11:00:00 PM

Identifiers

  • HAL Id : hal-02044923, version 1

Collections

Citation

N. Rodriguez, A. Portavoce, J. Delalleau, C. Grosjean, V. Serradeil, et al.. Arsenic and phosphorus codiffusion during silicon microelectronic processes. Thin Solid Films, Elsevier, 2010, 518 (17), pp.5022-5027. ⟨hal-02044923⟩

Share

Metrics

Record views

33