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Journal Articles Applied Physics Letters Year : 2009

Subnanometric Si film reactive diffusion on Ni

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hal-02044925 , version 1 (21-02-2019)

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  • HAL Id : hal-02044925 , version 1

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A. Portavoce, B. Lalmi, G. Tréglia, Christophe Girardeaux, Dominique Mangelinck, et al.. Subnanometric Si film reactive diffusion on Ni. Applied Physics Letters, 2009, 95 (2), pp.023111. ⟨hal-02044925⟩
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