Growth and Dissolution Kinetics of Ultra Thin Silicon Films on Cu(100)

B. Lalmi; Christophe Girardeaux; A. Portavoce; J. Bernardini; B. Aufray

Journal Articles Journal of Nanoscience and Nanotechnology Year : 2009

Growth and Dissolution Kinetics of Ultra Thin Silicon Films on Cu(100)

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B. Lalmi

Function : Author

Laboratoire de photonique et de nanostructures

Christophe Girardeaux

Function : Author
PersonId : 172869
IdHAL : christophe-girardeaux
ORCID : 0000-0002-7159-3785
IdRef : 078779375

Institut des Matériaux, de Microélectronique et des Nanosciences de Provence

A. Portavoce

Function : Author

Institut des Matériaux, de Microélectronique et des Nanosciences de Provence

J. Bernardini

Function : Author
PersonId : 850162

Laboratoire matériaux et microélectronique de Provence

B. Aufray

Function : Author

Centre Interdisciplinaire de Nanoscience de Marseille

Domains

Physics [physics] Condensed Matter [cond-mat] Materials Science [cond-mat.mtrl-sci]

Christophe Girardeaux : Connect in order to contact the contributor

https://hal-amu.archives-ouvertes.fr/hal-02044928

Submitted on : Thursday, February 21, 2019-4:59:26 PM

Last modification on : Friday, March 24, 2023-2:53:09 PM

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hal-02044928 , version 1 (21-02-2019)

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HAL Id : hal-02044928 , version 1

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B. Lalmi, Christophe Girardeaux, A. Portavoce, J. Bernardini, B. Aufray. Growth and Dissolution Kinetics of Ultra Thin Silicon Films on Cu(100). Journal of Nanoscience and Nanotechnology, 2009, 9 (7), pp.4311-4315. ⟨hal-02044928⟩

Growth and Dissolution Kinetics of Ultra Thin Silicon Films on Cu(100)

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