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Transition from anomalous kinetics toward Fickian diffusion for Si dissolution into amorphous Ge

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https://hal-amu.archives-ouvertes.fr/hal-02044980
Contributor : Christophe Girardeaux Connect in order to contact the contributor
Submitted on : Thursday, February 21, 2019 - 5:05:56 PM
Last modification on : Tuesday, October 19, 2021 - 11:00:02 PM

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  • HAL Id : hal-02044980, version 1

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Zoltan Balogh, Zoltán Erdélyi, Dezső Beke, Gábor Langer, Attila Csik, et al.. Transition from anomalous kinetics toward Fickian diffusion for Si dissolution into amorphous Ge. Applied Physics Letters, American Institute of Physics, 2008, 92 (14), pp.143104. ⟨hal-02044980⟩

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