Transition from anomalous kinetics toward Fickian diffusion for Si dissolution into amorphous Ge

Zoltan Balogh; Zoltán Erdélyi; Dezső Beke; Gábor Langer; Attila Csik; Hans-Gerd Boyen; Ulf Wiedwald; Paul Ziemann; Alain Portavoce; Christophe Girardeaux

Journal articles

Transition from anomalous kinetics toward Fickian diffusion for Si dissolution into amorphous Ge

Zoltan Balogh ¹ Zoltán Erdélyi Dezső Beke Gábor Langer Attila Csik ² Hans-Gerd Boyen Ulf Wiedwald ³ Paul Ziemann ³ Alain Portavoce ⁴ Christophe Girardeaux ^{5, 4}

1 University of Bern

2 ATOMKI - Institute for Nuclear Research [Budapest]

3 Universität Ulm - Ulm University [Ulm, Allemagne]

4 IM2NP - Institut des Matériaux, de Microélectronique et des Nanosciences de Provence

5 L2MP - Laboratoire matériaux et microélectronique de Provence

Document type :

Journal articles

Domain :

Physics [physics] / Condensed Matter [cond-mat] / Materials Science [cond-mat.mtrl-sci]

Complete list of metadata

https://hal-amu.archives-ouvertes.fr/hal-02044980
Contributor : Christophe Girardeaux Connect in order to contact the contributor
Submitted on : Thursday, February 21, 2019 - 5:05:56 PM
Last modification on : Tuesday, October 19, 2021 - 11:00:02 PM

Transition from anomalous kinetics toward Fickian diffusion for Si dissolution into amorphous Ge

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Transition from anomalous kinetics toward Fickian diffusion for Si dissolution into amorphous Ge

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