Transition from anomalous kinetics toward Fickian diffusion for Si dissolution into amorphous Ge

Zoltan Balogh (1) , Zoltán Erdélyi , Dezső Beke , Gábor Langer , Attila Csik (2) , Hans-Gerd Boyen , Ulf Wiedwald (3) , Paul Ziemann (3) , Alain Portavoce (4) , Christophe Girardeaux (5, 4)

1 University of Bern
2 ATOMKI - Institute for Nuclear Research [Budapest]
3 Universität Ulm - Ulm University [Ulm, Allemagne]
4 IM2NP - Institut des Matériaux, de Microélectronique et des Nanosciences de Provence
5 L2MP - Laboratoire matériaux et microélectronique de Provence

Domains: Materials Science [cond-mat.mtrl-sci]

Zoltan Balogh, Zoltán Erdélyi, Dezső Beke, Gábor Langer, Attila Csik, et al.. Transition from anomalous kinetics toward Fickian diffusion for Si dissolution into amorphous Ge. Applied Physics Letters, 2008, 92 (14), pp.143104. ⟨hal-02044980⟩