Sb Diffusion and Segregation in Amorphous Si Thin Films

G. Lanza; J. Nyéki; Christophe Girardeaux; Z. Erdélyi; A. Csik; Lajos Daróczi; G. Langer; Dezső Beke; Andree Rolland; Jean Bernardini; G. Erdélyi

Journal Articles Defect and Diffusion Forum Year : 2005

Sb Diffusion and Segregation in Amorphous Si Thin Films

, , (1, 2) , , (3) , , , , , (2) ,

1
2
3

G. Lanza

Function : Author

J. Nyéki

Function : Author

Christophe Girardeaux

Function : Author
PersonId : 172869
IdHAL : christophe-girardeaux
ORCID : 0000-0002-7159-3785
IdRef : 078779375

Laboratoire matériaux et microélectronique de Provence

Institut des Matériaux, de Microélectronique et des Nanosciences de Provence

Z. Erdélyi

Function : Author

A. Csik

Function : Author

Institute for Nuclear Research [Budapest]

Lajos Daróczi

Function : Author

G. Langer

Function : Author

Dezső Beke

Function : Author

Andree Rolland

Function : Author

Jean Bernardini

Function : Author
PersonId : 856690

Institut des Matériaux, de Microélectronique et des Nanosciences de Provence

G. Erdélyi

Function : Author

Domains

Physics [physics] Condensed Matter [cond-mat] Materials Science [cond-mat.mtrl-sci]

Christophe Girardeaux : Connect in order to contact the contributor

https://hal-amu.archives-ouvertes.fr/hal-02045010

Submitted on : Thursday, February 21, 2019-5:22:04 PM

Last modification on : Friday, March 24, 2023-2:53:09 PM

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hal-02045010 , version 1 (21-02-2019)

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HAL Id : hal-02045010 , version 1

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G. Lanza, J. Nyéki, Christophe Girardeaux, Z. Erdélyi, A. Csik, et al.. Sb Diffusion and Segregation in Amorphous Si Thin Films. Defect and Diffusion Forum, 2005, 237-240, pp.1246-1251. ⟨hal-02045010⟩

Sb Diffusion and Segregation in Amorphous Si Thin Films

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