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Key Parameters Driving Transistor Degradation in Advanced Strained SiGe Channels

V. Huard C. Ndiaye M. Arabi N. Parihar X. Federspiel S. Mhira S. Mahapatra A. Bravaix 1
1 IM2NP - Institut des Matériaux, de Microélectronique et des Nanosciences de Provence
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Conference papers
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https://hal-amu.archives-ouvertes.fr/hal-02111112
Contributor : Im2np Bibliométrie <>
Submitted on : Thursday, April 25, 2019 - 5:52:49 PM
Last modification on : Friday, April 26, 2019 - 1:36:30 AM

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  • HAL Id : hal-02111112, version 1

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V. Huard, C. Ndiaye, M. Arabi, N. Parihar, X. Federspiel, et al.. Key Parameters Driving Transistor Degradation in Advanced Strained SiGe Channels. IEEE International Reliability Physics Symposium, (IRPS), Mar 2018, Burlingame, California, United States. ⟨hal-02111112⟩

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