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Dopant diffusivity and solubility in nickel silicides

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https://hal-amu.archives-ouvertes.fr/hal-02385407
Contributor : Alain Portavoce <>
Submitted on : Thursday, November 28, 2019 - 5:43:27 PM
Last modification on : Thursday, April 9, 2020 - 1:21:45 AM

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Ivan Blum, Alain Portavoce, Khalid Hoummada, Gamra Tellouche, Lee Chow, et al.. Dopant diffusivity and solubility in nickel silicides. physica status solidi (c), Wiley, 2011, 8 (3), pp.670-673. ⟨10.1002/pssc.201000283⟩. ⟨hal-02385407⟩

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