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Physical origin of thickness-controlled sequential phase formation during reactive diffusion: Atomistic modeling

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https://hal-amu.archives-ouvertes.fr/hal-02386084
Contributor : Alain Portavoce <>
Submitted on : Friday, November 29, 2019 - 10:45:11 AM
Last modification on : Friday, April 24, 2020 - 10:28:08 AM

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A. Portavoce, G. Tréglia. Physical origin of thickness-controlled sequential phase formation during reactive diffusion: Atomistic modeling. Physical Review B: Condensed Matter and Materials Physics, American Physical Society, 2010, 82 (20), ⟨10.1103/PhysRevB.82.205431⟩. ⟨hal-02386084⟩

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