Physical origin of thickness-controlled sequential phase formation during reactive diffusion: Atomistic modeling

A. Portavoce; G. Tréglia

doi:10.1103/PhysRevB.82.205431

Journal Articles Physical Review B: Condensed Matter and Materials Physics (1998-2015) Year : 2010

Physical origin of thickness-controlled sequential phase formation during reactive diffusion: Atomistic modeling

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A. Portavoce

Function : Author
PersonId : 864373
ORCID : 0000-0002-6390-1637

Institut des Matériaux, de Microélectronique et des Nanosciences de Provence

G. Tréglia

Function : Author
PersonId : 171454
IdHAL : guy-treglia
ORCID : 0000-0001-9469-3140
IdRef : 067691110

Centre Interdisciplinaire de Nanoscience de Marseille

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Materials Science [cond-mat.mtrl-sci]

Alain Portavoce : Connect in order to contact the contributor

https://hal-amu.archives-ouvertes.fr/hal-02386084

Submitted on : Friday, November 29, 2019-10:45:11 AM

Last modification on : Friday, March 24, 2023-2:53:14 PM

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hal-02386084 , version 1 (29-11-2019)

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HAL Id : hal-02386084 , version 1
DOI : 10.1103/PhysRevB.82.205431

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A. Portavoce, G. Tréglia. Physical origin of thickness-controlled sequential phase formation during reactive diffusion: Atomistic modeling. Physical Review B: Condensed Matter and Materials Physics (1998-2015), 2010, 82 (20), ⟨10.1103/PhysRevB.82.205431⟩. ⟨hal-02386084⟩

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Physical origin of thickness-controlled sequential phase formation during reactive diffusion: Atomistic modeling

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