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Arsenic and phosphorus codiffusion during silicon microelectronic processes

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https://hal-amu.archives-ouvertes.fr/hal-02386094
Contributor : Alain Portavoce <>
Submitted on : Friday, November 29, 2019 - 10:47:42 AM
Last modification on : Saturday, November 30, 2019 - 1:44:24 AM

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N. Rodriguez, A. Portavoce, J. Delalleau, C. Grosjean, V. Serradeil, et al.. Arsenic and phosphorus codiffusion during silicon microelectronic processes. Thin Solid Films, Elsevier, 2010, 518 (17), pp.5022-5027. ⟨10.1016/j.tsf.2010.03.039⟩. ⟨hal-02386094⟩

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