Arsenic and phosphorus codiffusion during silicon microelectronic processes - Archive ouverte HAL Access content directly
Journal Articles Thin Solid Films Year : 2010
Not file

Dates and versions

hal-02386094 , version 1 (29-11-2019)

Identifiers

Cite

N. Rodriguez, A. Portavoce, J. Delalleau, C. Grosjean, V. Serradeil, et al.. Arsenic and phosphorus codiffusion during silicon microelectronic processes. Thin Solid Films, 2010, 518 (17), pp.5022-5027. ⟨10.1016/j.tsf.2010.03.039⟩. ⟨hal-02386094⟩
16 View
0 Download

Altmetric

Share

Gmail Facebook Twitter LinkedIn More