Skip to Main content Skip to Navigation
New interface
Journal articles

Arsenic and phosphorus codiffusion during silicon microelectronic processes

Complete list of metadata

https://hal-amu.archives-ouvertes.fr/hal-02386094
Contributor : Alain Portavoce Connect in order to contact the contributor
Submitted on : Friday, November 29, 2019 - 10:47:42 AM
Last modification on : Tuesday, October 19, 2021 - 11:00:04 PM

Identifiers

Collections

Citation

N. Rodriguez, A. Portavoce, J. Delalleau, C. Grosjean, V. Serradeil, et al.. Arsenic and phosphorus codiffusion during silicon microelectronic processes. Thin Solid Films, 2010, 518 (17), pp.5022-5027. ⟨10.1016/j.tsf.2010.03.039⟩. ⟨hal-02386094⟩

Share

Metrics

Record views

15