Journal Articles
Thin Solid Films
Year : 2010
Alain Portavoce : Connect in order to contact the contributor
https://hal-amu.archives-ouvertes.fr/hal-02386094
Submitted on : Friday, November 29, 2019-10:47:42 AM
Last modification on : Wednesday, February 8, 2023-5:11:10 PM
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N. Rodriguez, A. Portavoce, J. Delalleau, C. Grosjean, V. Serradeil, et al.. Arsenic and phosphorus codiffusion during silicon microelectronic processes. Thin Solid Films, 2010, 518 (17), pp.5022-5027. ⟨10.1016/j.tsf.2010.03.039⟩. ⟨hal-02386094⟩
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