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Triple-junction contribution to diffusion in nanocrystalline Si

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https://hal-amu.archives-ouvertes.fr/hal-02386097
Contributor : Alain Portavoce <>
Submitted on : Friday, November 29, 2019 - 10:49:05 AM
Last modification on : Saturday, November 30, 2019 - 1:44:18 AM

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A. Portavoce, L. Chow, J. Bernardini. Triple-junction contribution to diffusion in nanocrystalline Si. Applied Physics Letters, American Institute of Physics, 2010, 96 (21), pp.214102. ⟨10.1063/1.3435476⟩. ⟨hal-02386097⟩

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