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B diffusion in implanted Ni2Si and NiSi layers

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https://hal-amu.archives-ouvertes.fr/hal-02386108
Contributor : Alain Portavoce <>
Submitted on : Friday, November 29, 2019 - 10:51:32 AM
Last modification on : Thursday, June 11, 2020 - 5:04:06 PM

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I. Blum, A. Portavoce, L. Chow, D. Mangelinck, K. Hoummada, et al.. B diffusion in implanted Ni2Si and NiSi layers. Applied Physics Letters, American Institute of Physics, 2010, 96 (5), pp.054102. ⟨10.1063/1.3303988⟩. ⟨hal-02386108⟩

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