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Submitted on : Friday, November 29, 2019 - 10:52:48 AM Last modification on : Monday, December 14, 2020 - 3:08:16 AM
I. Blum, A. Portavoce, D. Mangelinck, R. Daineche, K. Hoummada, et al.. Measurement of As diffusivity in Ni2Si thin films. Microelectronic Engineering, Elsevier, 2010, 87 (3), pp.263-266. ⟨10.1016/j.mee.2009.05.020⟩. ⟨hal-02386115⟩