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Measurement of As diffusivity in Ni2Si thin films

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https://hal-amu.archives-ouvertes.fr/hal-02386115
Contributor : Alain Portavoce <>
Submitted on : Friday, November 29, 2019 - 10:52:48 AM
Last modification on : Thursday, June 11, 2020 - 5:04:07 PM

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I. Blum, A. Portavoce, D. Mangelinck, R. Daineche, K. Hoummada, et al.. Measurement of As diffusivity in Ni2Si thin films. Microelectronic Engineering, Elsevier, 2010, 87 (3), pp.263-266. ⟨10.1016/j.mee.2009.05.020⟩. ⟨hal-02386115⟩

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