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Journal Articles Microelectronic Engineering Year : 2010

Measurement of As diffusivity in Ni2Si thin films

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hal-02386115 , version 1 (29-11-2019)

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I. Blum, A. Portavoce, D. Mangelinck, R. Daineche, K. Hoummada, et al.. Measurement of As diffusivity in Ni2Si thin films. Microelectronic Engineering, 2010, 87 (3), pp.263-266. ⟨10.1016/j.mee.2009.05.020⟩. ⟨hal-02386115⟩
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