Journal Articles
Microelectronic Engineering
Year : 2010
Alain Portavoce : Connect in order to contact the contributor
https://hal-amu.archives-ouvertes.fr/hal-02386115
Submitted on : Friday, November 29, 2019-10:52:48 AM
Last modification on : Friday, March 24, 2023-2:53:14 PM
Cite
I. Blum, A. Portavoce, D. Mangelinck, R. Daineche, K. Hoummada, et al.. Measurement of As diffusivity in Ni2Si thin films. Microelectronic Engineering, 2010, 87 (3), pp.263-266. ⟨10.1016/j.mee.2009.05.020⟩. ⟨hal-02386115⟩
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