Transition from anomalous kinetics toward Fickian diffusion for Si dissolution into amorphous Ge

Zoltan Balogh (1) , Zoltán Erdélyi , Dezső Beke , Gábor Langer , Attila Csik (2) , Hans-Gerd Boyen , Ulf Wiedwald (3) , Paul Ziemann (3) , Alain Portavoce (4) , Christophe Girardeaux (4)

1 UNIBE - Universität Bern / University of Bern
2 ATOMKI - Institute for Nuclear Research [Budapest]
3 Universität Ulm - Ulm University [Ulm, Allemagne]
4 IM2NP - Institut des Matériaux, de Microélectronique et des Nanosciences de Provence

Domaines: Science des matériaux [cond-mat.mtrl-sci]

Zoltan Balogh, Zoltán Erdélyi, Dezső Beke, Gábor Langer, Attila Csik, et al.. Transition from anomalous kinetics toward Fickian diffusion for Si dissolution into amorphous Ge. Applied Physics Letters, 2008, 92 (14), pp.143104. ⟨10.1063/1.2908220⟩. ⟨hal-02386158⟩