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Transition from anomalous kinetics toward Fickian diffusion for Si dissolution into amorphous Ge

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https://hal-amu.archives-ouvertes.fr/hal-02386158
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Submitted on : Friday, November 29, 2019 - 11:05:46 AM
Last modification on : Saturday, November 30, 2019 - 1:44:32 AM

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Zoltan Balogh, Zoltán Erdélyi, Dezső Beke, Gábor Langer, Attila Csik, et al.. Transition from anomalous kinetics toward Fickian diffusion for Si dissolution into amorphous Ge. Applied Physics Letters, American Institute of Physics, 2008, 92 (14), pp.143104. ⟨10.1063/1.2908220⟩. ⟨hal-02386158⟩

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