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Diffusion and Redistribution of Boron in Nickel Silicides

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https://hal-amu.archives-ouvertes.fr/hal-02393983
Contributor : Alain Portavoce <>
Submitted on : Wednesday, December 4, 2019 - 3:48:32 PM
Last modification on : Thursday, April 9, 2020 - 1:21:45 AM

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Ivan Blum, Alain Portavoce, Lee Chow, Khalid Hoummada, Dominique Mangelinck. Diffusion and Redistribution of Boron in Nickel Silicides. Defect and Diffusion Forum, Trans Tech Publications, 2012, 323-325, pp.415-420. ⟨10.4028/www.scientific.net/DDF.323-325.415⟩. ⟨hal-02393983⟩

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