Diffusion and Redistribution of Boron in Nickel Silicides - Archive ouverte HAL Access content directly
Journal Articles Defect and Diffusion Forum Year : 2012
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hal-02393983 , version 1 (04-12-2019)

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Ivan Blum, Alain Portavoce, Lee Chow, Khalid Hoummada, Dominique Mangelinck. Diffusion and Redistribution of Boron in Nickel Silicides. Defect and Diffusion Forum, 2012, 323-325, pp.415-420. ⟨10.4028/www.scientific.net/DDF.323-325.415⟩. ⟨hal-02393983⟩
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