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Bridging the length scales between lithographic patterning and self assembly mechanisms in fabrication of semiconductor nanostructure arrays

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Submitted on : Wednesday, December 4, 2019 - 3:56:34 PM
Last modification on : Tuesday, October 19, 2021 - 11:00:04 PM

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R Hull, J Floro, M Gherasimova, J Graham, J. Gray, et al.. Bridging the length scales between lithographic patterning and self assembly mechanisms in fabrication of semiconductor nanostructure arrays. Journal of Physics: Conference Series, IOP Publishing, 2010, 209, pp.012003. ⟨10.1088/1742-6596/209/1/012003⟩. ⟨hal-02394016⟩

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