Thin film dissolution into semi-infinite substrates: surprising interface kinetics and dissolution modes

Z Erdélyi (1) , Ch Girardeaux (2) , D L Beke (1) , J. Bernardini (2) , A. Portavoce (2) , G L Katona (1) , Z Balogh (1) , A Rolland (2)

1 University of Debrecen Egyetem [Debrecen]
2 AMU - Aix Marseille Université

Depending on the thermodynamic, structural and diffusion properties of the system, a thin deposit dissolves into a substrate by different mechanisms. In this communication these different behaviours, investigated by surface analytical techniques (AES, XPS, STM, UPS, etc) [1-7], are reviewed. The experiments were also supported by computer simulations. The obtained results are compared and it is summarized how different parameters influence the dissolution of a thin film in a substrate. Furthermore, it is show that i) the volume dissolution kinetics is different on the atomic-/nano-scale than on the microscopic scale due to the diffusion asymmetry ii) the volume and GB diffusion in one measurement can be separated and iii) pure (C-kinetic) GB diffusivities can be determined from thin film kinetics measurements performed under adequate conditions.

Mots clés: thin film dissolution; anomalous diffusion kinetics; solid state reaction; AES; XPS; XRD; computer simulations and experiments

Domaines: Science des matériaux [cond-mat.mtrl-sci]

Z Erdélyi, Ch Girardeaux, D L Beke, J. Bernardini, A. Portavoce, et al.. Thin film dissolution into semi-infinite substrates: surprising interface kinetics and dissolution modes. Defect and Diffusion Forum, 2009, 289-292, pp.573-585. ⟨hal-02406639⟩