, International Technology Roadmap for Semiconductors, 2003.
, Appl. Phys. Lett, vol.82, p.3469, 2003.
, Appl. Phys. Lett, vol.82, p.3647, 2003.
, Appl. Phys. Lett, vol.84, p.4283, 2004.
, J. Appl. Phys, vol.43, p.83, 1972.
, J. Electrochem. Soc, vol.132, p.2457, 1985.
, Mat. Res. Soc. Symp. Proc, vol.717, p.103, 2002.
, J. Appl. Phys, vol.68, p.3250, 1990.
, Nucl. Instrum. Methods B, vol.67, p.495, 1992.
, Diffusion in Semiconductors and Non-Metallic Solids, vol.33, 1998.
, J. Appl. Phys, vol.22, p.74, 1951.
, Concentration profiles of diffused dopants in silicon: Impurity Doping Processes in Silicon, p.135, 1981.
, Appl. Phys. Lett, vol.82, p.2254, 2003.
, Binary Alloy Phase Diagrams, 1996.