Journal articles
In-situ interferometric monitoring of optical coatings
Abstract : We present a new method for the in situ measurement of the amplitude and phase of the reflection coefficient of a plane substrate installed in a mechanical holder rotating at high speed (120 turns per minute) during the deposition of an optical thin-film stack. Our method is based on digital holography and uses a self-referenced scheme to cancel the effects of the severe constraints generated by the vibrational and thermal environment of the deposition machine.
Cited literature [12 references]
https://hal-amu.archives-ouvertes.fr/hal-02996115
Contributor : Julien Lumeau Connect in order to contact the contributor
Submitted on : Monday, November 9, 2020 - 2:51:22 PM
Last modification on : Tuesday, October 19, 2021 - 10:50:03 PM
Long-term archiving on: : Wednesday, February 10, 2021 - 7:09:09 PM
Contributor : Julien Lumeau Connect in order to contact the contributor
Submitted on : Monday, November 9, 2020 - 2:51:22 PM
Last modification on : Tuesday, October 19, 2021 - 10:50:03 PM
Long-term archiving on: : Wednesday, February 10, 2021 - 7:09:09 PM
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Distributed under a Creative Commons Attribution 4.0 International License