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Abstract : We present a new method for the in situ measurement of the amplitude and phase of the reflection coefficient of a plane substrate installed in a mechanical holder rotating at high speed (120 turns per minute) during the deposition of an optical thin-film stack. Our method is based on digital holography and uses a self-referenced scheme to cancel the effects of the severe constraints generated by the vibrational and thermal environment of the deposition machine.
https://hal-amu.archives-ouvertes.fr/hal-02996115 Contributor : Julien LumeauConnect in order to contact the contributor Submitted on : Monday, November 9, 2020 - 2:51:22 PM Last modification on : Wednesday, November 3, 2021 - 5:51:52 AM Long-term archiving on: : Wednesday, February 10, 2021 - 7:09:09 PM
Séverin L Nadji, Michel Lequime, Thomas Begou, Cihan Koc, Catherine Grèzes-Besset, et al.. In-situ interferometric monitoring of optical coatings. Optics Express, Optical Society of America - OSA Publishing, 2020, 28 (15), pp.22012-22026. ⟨10.1364/OE.394953⟩. ⟨hal-02996115⟩