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Application of static masking technique in Magnetron Sputtering Technology for the production of linearly variable filters

Abstract : Variable filters are key components for compact spectral imagers. In this paper, we present a method for the fabrication of linearly variable filters based on Bühler HELIOS machine (plasma assisted reactive magnetron sputtering). These filters are obtained by producing a variation of the thickness of all the layers of the coating, using adapted masks placed in between the sputtering targets for the low and high refractive index materials and the substrates. Variable band pass filter from 550 nm up to 1000 nm is demonstrated.
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https://hal-amu.archives-ouvertes.fr/hal-03407033
Contributor : Julien Lumeau Connect in order to contact the contributor
Submitted on : Thursday, October 28, 2021 - 11:17:21 AM
Last modification on : Tuesday, October 18, 2022 - 3:59:35 PM
Long-term archiving on: : Saturday, January 29, 2022 - 6:48:57 PM

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Thomas Begou, Frédéric Lemarquis, Antonin Moreau, Fabien Lemarchand, Holger Reus, et al.. Application of static masking technique in Magnetron Sputtering Technology for the production of linearly variable filters. CEAS Space Journal, 2021, ⟨10.1007/s12567-021-00402-3⟩. ⟨hal-03407033⟩

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