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Atomic force microscopy and in situ-annealing X-ray diffraction study on template-stripped gold substrates for optimum self-assembled monolayer deposition

Abstract : Literature is well supplied with studies of gold deposit on mica for fabricating ultra-flat template-stripped gold surface. Gold on silicon has not received much attention. Our study optimizes the deposition rates, annealing temperatures and time to obtain a template-stripped gold surface with a very low roughness and large (111) oriented crystallites. Atomic force microscopy is performed in tapping and peak force mode to evaluate the surface roughness. The crystallite size is obtained from in situ X-ray diffraction measurements during annealing. We find out that a deposition rate of 0.2 nm/s with a 40 min annealing at 400°C gives the best result (0.21±0.04) nm.
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https://hal-amu.archives-ouvertes.fr/hal-03436579
Contributor : Estéban Sanchez-Adaime Connect in order to contact the contributor
Submitted on : Saturday, November 20, 2021 - 12:12:16 PM
Last modification on : Thursday, November 25, 2021 - 10:02:09 AM

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Distributed under a Creative Commons Attribution - NonCommercial - NoDerivatives 4.0 International License

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E. Sanchez-Adaime, D. Duché, S. Escoubas, V. Jangid, L. Nony, et al.. Atomic force microscopy and in situ-annealing X-ray diffraction study on template-stripped gold substrates for optimum self-assembled monolayer deposition. Thin Solid Films, Elsevier, 2021, 739, pp.138978. ⟨10.1016/j.tsf.2021.138978⟩. ⟨hal-03436579⟩

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