Analysis of the stability of native oxide films at liquid lead/metal interfaces

C. Lesueur; D. Chatain; Claire Bergman; P. Gas; F. Baqué

doi:10.1051/jp4:20020330

Journal Articles Journal de Physique IV Proceedings Year : 2002

Analysis of the stability of native oxide films at liquid lead/metal interfaces

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1
2
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C. Lesueur

Function : Author

D. Chatain

Function : Author
PersonId : 18129
IdHAL : dominique-chatain
ORCID : 0000-0002-9654-7291
IdRef : 084054719

Centre Interdisciplinaire de Nanoscience de Marseille

CV

Claire Bergman

Function : Author
PersonId : 877131

P. Gas

Function : Author

Laboratoire matériaux et microélectronique de Provence

F. Baqué

Function : Author

CEA Cadarache

Domains

Chemical Sciences Material chemistry Physics [physics] Chemical Sciences Physics [physics] Condensed Matter [cond-mat]

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https://hal-amu.archives-ouvertes.fr/hal-01722642

Submitted on : Sunday, March 4, 2018-8:33:48 PM

Last modification on : Friday, March 24, 2023-2:53:06 PM

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hal-01722642 , version 1 (04-03-2018)

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HAL Id : hal-01722642 , version 1
DOI : 10.1051/jp4:20020330

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C. Lesueur, D. Chatain, Claire Bergman, P. Gas, F. Baqué. Analysis of the stability of native oxide films at liquid lead/metal interfaces. Journal de Physique IV Proceedings, 2002, 12 (8), pp.155 - 162. ⟨10.1051/jp4:20020330⟩. ⟨hal-01722642⟩

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Analysis of the stability of native oxide films at liquid lead/metal interfaces

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