Two-Dimensional Polymer as a Mask for Surface Nanopatterning

Sylvain Clair; Oualid Ourdjini; Mathieu Abel; Louis Porte

doi:10.1002/adma.201200063

Journal Articles Advanced Materials Year : 2012

Two-Dimensional Polymer as a Mask for Surface Nanopatterning

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1

Sylvain Clair

Function : Author
PersonId : 17122
IdHAL : sylvain-clair
ORCID : 0000-0002-8751-1887
IdRef : 20012577X

Institut des Matériaux, de Microélectronique et des Nanosciences de Provence

Oualid Ourdjini

Function : Author

Institut des Matériaux, de Microélectronique et des Nanosciences de Provence

Mathieu Abel

Function : Author
PersonId : 19316
IdHAL : mathieu-abel
ORCID : 0000-0002-6730-766X
IdRef : 139830138

Institut des Matériaux, de Microélectronique et des Nanosciences de Provence

Louis Porte

Function : Author

Institut des Matériaux, de Microélectronique et des Nanosciences de Provence

Domains

Physics [physics] Condensed Matter [cond-mat] Materials Science [cond-mat.mtrl-sci] Chemical Sciences Material chemistry

Sylvain Clair : Connect in order to contact the contributor

https://hal-amu.archives-ouvertes.fr/hal-01896196

Submitted on : Monday, October 15, 2018-8:30:01 PM

Last modification on : Tuesday, October 19, 2021-11:00:02 PM

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hal-01896196 , version 1 (15-10-2018)

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HAL Id : hal-01896196 , version 1
DOI : 10.1002/adma.201200063

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Sylvain Clair, Oualid Ourdjini, Mathieu Abel, Louis Porte. Two-Dimensional Polymer as a Mask for Surface Nanopatterning. Advanced Materials, 2012, 24 (9), pp.1252 - 1254. ⟨10.1002/adma.201200063⟩. ⟨hal-01896196⟩

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Two-Dimensional Polymer as a Mask for Surface Nanopatterning

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