Skip to Main content Skip to Navigation
Journal articles

Lattice and grain-boundary diffusion of As in Ni2Si

Complete list of metadata

https://hal-amu.archives-ouvertes.fr/hal-02386151
Contributor : Alain Portavoce Connect in order to contact the contributor
Submitted on : Friday, November 29, 2019 - 11:03:11 AM
Last modification on : Tuesday, October 19, 2021 - 11:00:01 PM

Identifiers

Citation

I. Blum, A. Portavoce, D. Mangelinck, R. Daineche, K. Hoummada, et al.. Lattice and grain-boundary diffusion of As in Ni2Si. Journal of Applied Physics, American Institute of Physics, 2008, 104 (11), pp.114312. ⟨10.1063/1.3035836⟩. ⟨hal-02386151⟩

Share

Metrics

Les métriques sont temporairement indisponibles