Evaluation of scanning capacitance microscopy sample preparation by focused ion beam

N. Rodriguez; J. Adrian; C. Grosjean; G. Haller; C. Girardeaux; A. Portavoce

doi:10.1016/j.microrel.2006.07.019

Journal Articles Microelectronics Reliability Year : 2006

Evaluation of scanning capacitance microscopy sample preparation by focused ion beam

(1) , (2) , , (3) , , (4)

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N. Rodriguez

Function : Author

Universidad de Granada = University of Granada

J. Adrian

Function : Author

ELF Atochem

C. Grosjean

Function : Author

G. Haller

Function : Author

STMicroelectronics [Rousset]

C. Girardeaux

Function : Author

A. Portavoce

Function : Author
PersonId : 864373
ORCID : 0000-0002-6390-1637

Institut des Matériaux, de Microélectronique et des Nanosciences de Provence

Domains

Physics [physics] Condensed Matter [cond-mat] Materials Science [cond-mat.mtrl-sci]

Alain Portavoce : Connect in order to contact the contributor

https://hal-amu.archives-ouvertes.fr/hal-02386240

Submitted on : Friday, November 29, 2019-11:27:40 AM

Last modification on : Friday, March 24, 2023-2:53:14 PM

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hal-02386240 , version 1 (29-11-2019)

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HAL Id : hal-02386240 , version 1
DOI : 10.1016/j.microrel.2006.07.019

Cite

N. Rodriguez, J. Adrian, C. Grosjean, G. Haller, C. Girardeaux, et al.. Evaluation of scanning capacitance microscopy sample preparation by focused ion beam. Microelectronics Reliability, 2006, 46 (9-11), pp.1554-1557. ⟨10.1016/j.microrel.2006.07.019⟩. ⟨hal-02386240⟩

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Evaluation of scanning capacitance microscopy sample preparation by focused ion beam

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