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Sequential Phase Formation during Reactive Diffusion of a Nanometric-Thick Mn Film on Ge(111)

Omar Abbes 1 Feng Xu 2 Alain Portavoce 3 Khalid Hoummada 3 Vinh Le Thanh 1 Christophe Girardeaux 3
1 CINaM - Centre Interdisciplinaire de Nanoscience de Marseille
2 School of Science, Wuhan University of Technology
3 IM2NP - Institut des Matériaux, de Microélectronique et des Nanosciences de Provence
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https://hal-amu.archives-ouvertes.fr/hal-02394001
Contributor : Alain Portavoce <>
Submitted on : Wednesday, December 4, 2019 - 3:52:59 PM
Last modification on : Friday, June 5, 2020 - 5:42:06 PM

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Omar Abbes, Feng Xu, Alain Portavoce, Khalid Hoummada, Vinh Le Thanh, et al.. Sequential Phase Formation during Reactive Diffusion of a Nanometric-Thick Mn Film on Ge(111). Solid State Phenomena, Trans Tech Publications Ltd 2011, 172-174, pp.579-584. ⟨10.4028/www.scientific.net/SSP.172-174.579⟩. ⟨hal-02394001⟩

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