Journal Articles
Applied Physics Letters
Year : 2009
Christophe Girardeaux : Connect in order to contact the contributor
https://hal-amu.archives-ouvertes.fr/hal-02044925
Submitted on : Thursday, February 21, 2019-4:58:13 PM
Last modification on : Friday, March 24, 2023-2:53:09 PM
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- HAL Id : hal-02044925 , version 1
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A. Portavoce, B. Lalmi, G. Tréglia, Christophe Girardeaux, Dominique Mangelinck, et al.. Subnanometric Si film reactive diffusion on Ni. Applied Physics Letters, 2009, 95 (2), pp.023111. ⟨hal-02044925⟩
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