Direct observation of Ni decorated dislocation loops within As+-implanted silicon and arsenic clustering in Ni silicide contact - Archive ouverte HAL Access content directly
Journal Articles Microelectronic Engineering Year : 2013
Not file

Dates and versions

hal-02385371 , version 1 (28-11-2019)

Identifiers

Cite

Khalid Hoummada, Gamra Tellouche, Ivan Blum, Alain Portavoce, Marion Descoins, et al.. Direct observation of Ni decorated dislocation loops within As+-implanted silicon and arsenic clustering in Ni silicide contact. Microelectronic Engineering, 2013, 107, pp.184-189. ⟨10.1016/j.mee.2012.12.008⟩. ⟨hal-02385371⟩
32 View
0 Download

Altmetric

Share

Gmail Facebook Twitter LinkedIn More