Journal Articles
Microelectronic Engineering
Year : 2013
Alain Portavoce : Connect in order to contact the contributor
https://hal-amu.archives-ouvertes.fr/hal-02385371
Submitted on : Thursday, November 28, 2019-5:31:23 PM
Last modification on : Wednesday, February 8, 2023-5:11:10 PM
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Khalid Hoummada, Gamra Tellouche, Ivan Blum, Alain Portavoce, Marion Descoins, et al.. Direct observation of Ni decorated dislocation loops within As+-implanted silicon and arsenic clustering in Ni silicide contact. Microelectronic Engineering, 2013, 107, pp.184-189. ⟨10.1016/j.mee.2012.12.008⟩. ⟨hal-02385371⟩
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