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Journal articles

Subnanometric Si film reactive diffusion on Ni

A. Portavoce 1 B. Lalmi 2 G. Tréglia 3 C. Girardeaux D. Mangelinck 1 B. Aufray 3 J. Bernardini 
1 IM2NP - Institut des Matériaux, de Microélectronique et des Nanosciences de Provence
2 LENAC - Laboratoire d'Electronique, Nanotechnologies, Capteurs
3 CINaM - Centre Interdisciplinaire de Nanoscience de Marseille
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https://hal-amu.archives-ouvertes.fr/hal-02386120
Contributor : Alain Portavoce Connect in order to contact the contributor
Submitted on : Friday, November 29, 2019 - 10:55:09 AM
Last modification on : Tuesday, October 19, 2021 - 11:00:01 PM

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UNIV-TLN | CNRS | UNIV-AMU | UNIV-LYON1 | IM2NP | CINAM | UDL

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A. Portavoce, B. Lalmi, G. Tréglia, C. Girardeaux, D. Mangelinck, et al.. Subnanometric Si film reactive diffusion on Ni. Applied Physics Letters, American Institute of Physics, 2009, 95 (2), pp.023111. ⟨10.1063/1.3177187⟩. ⟨hal-02386120⟩

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