Journal Articles
Applied Physics Letters
Year : 2009
Alain Portavoce : Connect in order to contact the contributor
https://hal-amu.archives-ouvertes.fr/hal-02386120
Submitted on : Friday, November 29, 2019-10:55:09 AM
Last modification on : Wednesday, February 8, 2023-5:11:10 PM
Cite
A. Portavoce, B. Lalmi, G. Tréglia, C. Girardeaux, D. Mangelinck, et al.. Subnanometric Si film reactive diffusion on Ni. Applied Physics Letters, 2009, 95 (2), pp.023111. ⟨10.1063/1.3177187⟩. ⟨hal-02386120⟩
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