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Subnanometric Si film reactive diffusion on Ni

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https://hal-amu.archives-ouvertes.fr/hal-02386120
Contributor : Alain Portavoce <>
Submitted on : Friday, November 29, 2019 - 10:55:09 AM
Last modification on : Tuesday, December 10, 2019 - 5:44:02 PM

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A. Portavoce, B. Lalmi, G. Tréglia, C. Girardeaux, D. Mangelinck, et al.. Subnanometric Si film reactive diffusion on Ni. Applied Physics Letters, American Institute of Physics, 2009, 95 (2), pp.023111. ⟨10.1063/1.3177187⟩. ⟨hal-02386120⟩

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