Subnanometric Si film reactive diffusion on Ni - Archive ouverte HAL Access content directly
Journal Articles Applied Physics Letters Year : 2009
Not file

Dates and versions

hal-02386120 , version 1 (29-11-2019)

Identifiers

Cite

A. Portavoce, B. Lalmi, G. Tréglia, C. Girardeaux, D. Mangelinck, et al.. Subnanometric Si film reactive diffusion on Ni. Applied Physics Letters, 2009, 95 (2), pp.023111. ⟨10.1063/1.3177187⟩. ⟨hal-02386120⟩
22 View
0 Download

Altmetric

Share

Gmail Facebook Twitter LinkedIn More