https://hal-amu.archives-ouvertes.fr/hal-02386120
Contributor : Alain Portavoce <>
Submitted on : Friday, November 29, 2019 - 10:55:09 AM Last modification on : Monday, March 29, 2021 - 3:08:06 PM
A. Portavoce, B. Lalmi, G. Tréglia, C. Girardeaux, D. Mangelinck, et al.. Subnanometric Si film reactive diffusion on Ni. Applied Physics Letters, American Institute of Physics, 2009, 95 (2), pp.023111. ⟨10.1063/1.3177187⟩. ⟨hal-02386120⟩