Reactive Diffusion of Thin Si Deposits into Ni (111)

B. Lalmi; C. Girardeaux; Alain Portavoce; Bernard Aufray; Jean Bernardini

doi:10.4028/www.scientific.net/DDF.323-325.421

Journal articles

Reactive Diffusion of Thin Si Deposits into Ni (111)

B. Lalmi ¹ C. Girardeaux Alain Portavoce ² Bernard Aufray ³ Jean Bernardini ²

1 LENAC - Laboratoire d'Electronique, Nanotechnologies, Capteurs

2 IM2NP - Institut des Matériaux, de Microélectronique et des Nanosciences de Provence

3 CINaM - Centre Interdisciplinaire de Nanoscience de Marseille

Document type :

Journal articles

Domain :

Physics [physics] / Condensed Matter [cond-mat] / Materials Science [cond-mat.mtrl-sci]

Complete list of metadatas

https://hal-amu.archives-ouvertes.fr/hal-02393979
Contributor : Alain Portavoce <>
Submitted on : Wednesday, December 4, 2019 - 3:47:24 PM
Last modification on : Thursday, December 5, 2019 - 1:39:13 AM

Reactive Diffusion of Thin Si Deposits into Ni (111)

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Reactive Diffusion of Thin Si Deposits into Ni (111)

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