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Submitted on : Wednesday, December 4, 2019 - 3:47:24 PM Last modification on : Tuesday, March 30, 2021 - 3:23:59 AM
B. Lalmi, C. Girardeaux, Alain Portavoce, Bernard Aufray, Jean Bernardini. Reactive Diffusion of Thin Si Deposits into Ni (111). Defect and Diffusion Forum, Trans Tech Publications, 2012, 323-325, pp.421-426. ⟨10.4028/www.scientific.net/DDF.323-325.421⟩. ⟨hal-02393979⟩