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Reactive Diffusion of Thin Si Deposits into Ni (111)

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https://hal-amu.archives-ouvertes.fr/hal-02393979
Contributor : Alain Portavoce <>
Submitted on : Wednesday, December 4, 2019 - 3:47:24 PM
Last modification on : Thursday, December 5, 2019 - 1:39:13 AM

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B. Lalmi, C. Girardeaux, Alain Portavoce, Bernard Aufray, Jean Bernardini. Reactive Diffusion of Thin Si Deposits into Ni (111). Defect and Diffusion Forum, Trans Tech Publications, 2012, 323-325, pp.421-426. ⟨10.4028/www.scientific.net/DDF.323-325.421⟩. ⟨hal-02393979⟩

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