Bridging the length scales between lithographic patterning and self assembly mechanisms in fabrication of semiconductor nanostructure arrays

R Hull , J Floro , M Gherasimova , J Graham , J. Gray , A. Portavoce (1) , F Ross , J Thorp

1 IM2NP - Institut des Matériaux, de Microélectronique et des Nanosciences de Provence

Domaines: Science des matériaux [cond-mat.mtrl-sci]

R Hull, J Floro, M Gherasimova, J Graham, J. Gray, et al.. Bridging the length scales between lithographic patterning and self assembly mechanisms in fabrication of semiconductor nanostructure arrays. Journal of Physics: Conference Series, 2010, 209, pp.012003. ⟨10.1088/1742-6596/209/1/012003⟩. ⟨hal-02394016⟩