Automated optical monitoring wavelength selection for thin-film filters

Janis Zideluns (1) , Fabien Lemarchand (1) , Detlef Arhilger (2) , Harro Hagedorn (2) , Julien Lumeau (1)

1 RCMO - RCMO
2 Buhler AG

In this paper we study the wavelength selection process for optical monitoring of thin film filters. We first discuss the technical limitations of monitoring systems as well as the criteria defining the sensitivity of different wavelengths to thickness errors. We then present an approach that considers the best monitoring wavelength for each individual layer with a monitoring strategy selection process that can be fully automated. We finally validate experimentally the proposed approach on several optical filters of increasing complexity. Optical interference filters with close to theoretical performances are demonstrated.

Keywords: thin film optical monitoring; magnetron sputtering; optical filter

Domains: Optics / Photonic

Janis Zideluns, Fabien Lemarchand, Detlef Arhilger, Harro Hagedorn, Julien Lumeau. Automated optical monitoring wavelength selection for thin-film filters. Optics Express, 2021, 29 (21), pp.33398-331413. ⟨10.1364/OE.439033⟩. ⟨hal-03407010⟩